INFRARED-ABSORPTION IN THICK-FILM RESISTORS


ULUG B., ULUG A., SENER E.

JOURNAL OF MATERIALS SCIENCE, cilt.30, ss.3346-3350, 1995 (SCI İndekslerine Giren Dergi) identifier identifier

  • Cilt numarası: 30 Konu: 13
  • Basım Tarihi: 1995
  • Doi Numarası: 10.1007/bf00349878
  • Dergi Adı: JOURNAL OF MATERIALS SCIENCE
  • Sayfa Sayıları: ss.3346-3350

Özet

Infrared absorption in polymer and glass-based thick film resistors has been measured between 400 and 1500 cm(-1). Sam pie structures are discussed on the basis of X-ray, Fourier transform-infrared and resistance-temperature data. It is shown that in polymer-based thick film resistors, the particulate phase is mostly responsible for the infrared absorption between 400 and 900 cm(-1), whereas the infrared absorption at higher wave numbers is related to the continuous phase. In glass-based thick film resistors, absorption is mostly determined by the highly doped glass. The results indicate that thick film resistors can be used as an absorbent coating in the 400-1500 cm(-1) region by suitable selection of the continuous and particulate phases.